| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern forming method, an actinic ray-sensitive or radiation-sensitive resin composition, and a resist film using the composition, excellent in sensitivity, limit resolving power, roughness characteristics, exposure latitude (EL), post-exposure baking (PEB) temperature dependency, and focus margin (DOF), and to provide a method for manufacturing an electronic device and an electronic device.SOLUTION: The pattern forming method comprises: (I) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition which comprises a resin having a repeating unit that is decomposed by an action of an acid to produce an alcoholic hydroxyl group and having a weight average molecular weight of 11,000 or more, and a compound expressed by general formula (1) below; (II) a step of exposing the film; and (III) a step of developing the exposed film by using a developing solution containing an organic solvent. In the formula, R represents an alkyl group, cycloalkyl group which may have a carbonyl carbon as a ring member, lactone structure, sultone structure, aryl group or a combination of two or more of the above groups or structures; and Mrepresents a monovalent cation. |
