发明名称 FILM FORMATION MASK, FILM FORMATION DEVICE, FILM FORMATION METHOD, AND TOUCH PANEL SUBSTRATE
摘要 <p>The present invention comprises: a first mask (2) forming a plurality of first open patterns (4) having the same shape dimensions as a thin-film pattern formed upon a substrate; and a second mask (3) forming a second open pattern (10) being of a size that encompasses at least one of the plurality of first open patterns (4), and arranged overlapping the first mask (2) so as to not bind to the first mask (2).</p>
申请公布号 WO2015034097(A1) 申请公布日期 2015.03.12
申请号 WO2014JP73761 申请日期 2014.09.09
申请人 V TECHNOLOGY CO., LTD. 发明人 SUGIMOTO, SHIGETO
分类号 C23C14/04;G06F3/041 主分类号 C23C14/04
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