发明名称 SILICON CARBIDE SEMICONDUCTOR DEVICE
摘要 <p>Electric field concentration can be easily generated in a residue part by a variation current in the high frequency switching operation of SBD, by an etching residue of a sharp end existing on the edge of a Schottky electrode. The present invention includes a drift layer (1b) of a first conductivity; a guard ring region (2) of a second conductivity in the drift layer (1b); a field insulating layer (3) that is formed to surround the guard ring region (2); a Schottky electrode (4) that is formed to cover the guard ring region (2) and the drift layer (1b) exposed to a surface in the guard ring (2), and wherein the edge thereof exists on the field insulating layer (3); and a surface electrode pad (5) formed on the Schottky electrode (4), wherein an edge of the surface electrode pad (5) passes the edge the Schottky electrode (4) and contacts the field insulating layer (3).</p>
申请公布号 KR20150026812(A) 申请公布日期 2015.03.11
申请号 KR20140100231 申请日期 2014.08.05
申请人 MITSUBISHI ELECTRIC CORPORATION 发明人 TARUI YOICHIRO;IMAIZUMI MASAYUKI;YUTANI NAOKI
分类号 H01L29/872 主分类号 H01L29/872
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