| 摘要 |
Provided in the present invention are an adhesive film which not only prevents inflow of an etching solution, but also does not generate adhesive residue on an object, and a surface protection film for chemical polishing. The surface protection film for chemical polishing including an adhesive layer on one surface of a resin film substrate is characterized by having the thickness of the resin film substrate of 75 μm or more, having the adhesive layer formed by using an acrylic adhesive composition containing a silane coupling agent and a crosslinking agent, not having penetration of hydrofluoric acid for at least 150 seconds on a part separated from the end of laminated surface of the surface protection film for chemical polishing in distance of 80 μm of the attachment surface of a glass surface which is an object, after soaking the surface protection film for chemical polishing in a aqueous hydrofluoric acid solution of temperature of 27°C and densityh of 15% while laminated on the glass substrate by interposing the adhesive layer. |
