半导体装置及其制造方法,申请号TW101129143-传众专利搜索

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发明名称	半导体装置及其制造方法
摘要
申请公布号	TWI476911	申请公布日期	2015.03.11
申请号	TW101129143	申请日期	2012.08.13
申请人	台湾积体电路制造股份有限公司	发明人	郑宗期;郑志成;赵志刚;苏庆煌;林彦华;施侑伸
分类号	H01L27/146;H01L21/265	主分类号	H01L27/146
代理机构		代理人	洪澄文台北市南港区三重路19之6号2楼;颜锦顺台北市南港区三重路19之6号2楼
主权项	一种半导体装置的制造方法，包括：利用一前侧离子植入制程在一基板中形成一光主动区；在该基板中形成一隔离区；利用一第一高能量离子植入制程将该光主动区延伸至一第一深度；以及利用一第二高能量离子植入制程将该隔离区延伸至该第一深度，其中该隔离区围绕该光主动区。
地址	新竹市新竹科学工业园区力行六路8号

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