发明名称 |
Flexible base material and flexible electronic device |
摘要 |
The invention provides a flexible base material and a flexible electronic device. The flexible base material includes a flexible substrate having a first surface and a second surface opposite to the first surface. A first organic composite barrier layer is deposited on the first surface of the flexible substrate, wherein the first organic composite barrier layer applies a first stress to the flexible substrate. An anti-curved layer is deposited on the second surface of the flexible substrate, wherein the anti-curved layer applies a second stress to the flexible substrate, and wherein the second stress applied by the anti-curved layer cancels off more than 90% of the first stress. |
申请公布号 |
US8975534(B2) |
申请公布日期 |
2015.03.10 |
申请号 |
US201113338081 |
申请日期 |
2011.12.27 |
申请人 |
Industrial Technology Research Institute |
发明人 |
Lai Li-Wen;Lin Kun-Wei;Chen Chun-Ting;Chang Chun-Hao |
分类号 |
H05K1/16;H05K1/18;H05K1/03;H01L51/00;H01L51/52;H05K1/02 |
主分类号 |
H05K1/16 |
代理机构 |
Muncy, Geissler, Olds & Lowe, P.C. |
代理人 |
Muncy, Geissler, Olds & Lowe, P.C. |
主权项 |
1. A flexible base material, comprising:
a flexible substrate having a first surface and a second surface opposite to the first surface; a first organic composite barrier layer deposited on the first surface of the flexible substrate, wherein the first organic composite barrier layer applies a first stress to the flexible substrate; and an anti-curved layer deposited on the second surface of the flexible substrate, wherein the anti-curved layer applies a second stress to the flexible substrate, and wherein the second stress applied by the anti-curved layer cancels off more than 90% of the first stress, wherein the first organic composite barrier layer comprises an organic material containing Si-(CH3)x bond or Si-(CH2)x bond, and wherein the anti-curved layer comprises silicon oxide (SiOx), silicon nitride (SiNx), and silicon oxynitride (SiOxNy), and wherein the first organic composite barrier layer comprises a first organic layer and a second organic layer, and the first organic layer is deposited between the flexible substrate and the second organic layer, wherein the first organic layer comprises an Si-O-Si bond and a ratio of the Si-O-Si bond to a Si-(CH3)x bond is smaller than 1 or equal to 1, and wherein the second organic layer comprises an Si-O-Si bond and a ratio of the Si-O-Si bond to a Si-(CH3)x bond is larger than 1. |
地址 |
Chutung, Hsinchu TW |