发明名称 |
Inspection apparatus |
摘要 |
Light that is scattered by a defect on a wafer is very weak, and a PMT and an MPPC are used as detection methods for measuring the weak light with high speed and sensitivity. The methods have a function of photoelectronically converting the weak light and multiplying an electron, but have a problem in that a signal light is lost and an S/N ratio is reduced because the quantum efficiency of the photoelectron conversion is as low as 50% or less. Direct light is amplified prior to the photoelectron conversion. The optical amplification is an amplification method in which the signal light and light of pump light are introduced into a rare-earth doped fiber, a stimulated emission is caused, and the signal light is amplified. In the present invention, the optical amplification is used. The amplification factor is changed according to various conditions. |
申请公布号 |
US8976347(B2) |
申请公布日期 |
2015.03.10 |
申请号 |
US201214236888 |
申请日期 |
2012.08.03 |
申请人 |
Hitachi High-Technologies Corporation |
发明人 |
Oku Mizuki;Shimura Kei |
分类号 |
G01N21/00;G01N21/95;G01N21/88 |
主分类号 |
G01N21/00 |
代理机构 |
McDermott Will & Emery LLP |
代理人 |
McDermott Will & Emery LLP |
主权项 |
1. An inspection apparatus that detects a defect of a substrate, comprising:
an illumination optical system that irradiates the substrate with an illumination light; a first detection optical system that detects a light from the substrate; a first optical amplification optical system that optically amplifies the light which is detected by the first detection optical system, the light being optically amplified by a stimulatedemission by an optical fiber;
a first excitation optical system that includes the optical fiber that generates a first excitation light for the optical amplification; a first photoelectron conversion system that photoelectronically converts the light which is amplified by the optical amplification optical system into an electric signal; and a processing unit that detects the defect by using the electric signal from the first photoelectron conversion system, wherein: a wavelength of the excitation light is shorter than a wavelength of the illumination light and a numerical aperture NA of the first detection optical system, a numerical aperture NA′ of the optical fiber, a diameter R of a spot of the illumination light, and a core diameter R′ of theoptical fiber satisfy the following relation:
NA=(NA′×R′)/R. |
地址 |
Tokyo JP |