DISTRIBUTION PART AND CLEANING APPARATUS FOR SUBSTRATE HAVING THE SAME

摘要

Provided are a spraying unit and a substrate cleaning apparatus including the same, capable of preventing a pattern leaning phenomenon in the substrate cleaning apparatus to clean and dry a semiconductor substrate on which a pattern is formed. The spraying unit to supply a cleaning agent and IPA to the substrate in the cleaning apparatus of the semiconductor substrate includes an IPA spray head which supplies the IPA to the substrate and a second fluid spray head which supplies a fluid which is heated with a temperature which is higher than the IPA when the IPA is supplied and supplies the fluid to the same location as the IPA spray head.