Exposure monitoring key to determine misalignment between blind and reticle

摘要

A reticle including exposure monitoring keys. The reticle includes an exposure region that is to be exposed to light during an exposure process, and a non-exposure region surrounding the exposure region and not to be exposed to the light. The exposure monitoring keys are disposed across a boundary between the exposure region and the non-exposure region.

主权项

1. A reticle, comprising:
an exposure region that is to be exposed to light during an exposure process; a non-exposure region surrounding the exposure region and not to be exposed to the light during the exposure process; and exposure monitoring keys disposed across a boundary between the exposure region and the non-exposure region, the exposure region comprising a pattern region in which target patterns are disposed, one part of each of the exposure monitoring keys disposed in the exposure region from out of the pattern region, and another part of the each exposure monitoring key disposed in the non-exposure region.