发明名称 Manufacturing method of glass substrate for magnetic disk, magnetic disk, and magnetic recording / reproducing device
摘要 A manufacturing method of a glass substrate for a magnetic disk is provided whereby nano pits and/or nano scratches cannot be easily produced in polishing a principal face of a glass substrate using a slurry containing zirconium oxide as an abrasive. The manufacturing method of a glass substrate for a magnetic disk includes, for instance, a polishing step of polishing a principal face of a glass substrate using a slurry containing, as an abrasive, zirconium oxide abrasive grains having monoclinic crystalline structures (M) and tetragonal crystalline structures (T).
申请公布号 US8974561(B2) 申请公布日期 2015.03.10
申请号 US201213627057 申请日期 2012.09.26
申请人 Hoya Corporation 发明人 Tamaki Masanori;Nakagawa Hiroki;Tawara Yoshihiro
分类号 G11B5/73;C03C21/00;G11B5/84;C03C19/00;C09G1/02;B24D3/00;A61C17/00 主分类号 G11B5/73
代理机构 Global IP Counselors, LLP 代理人 Global IP Counselors, LLP
主权项 1. A manufacturing method of a glass substrate for a magnetic disk, comprising: polishing a principal face of the glass substrate using a slurry containing zirconium oxide abrasive grains, each of the abrasive grains having zirconium oxide as a principal component, with the zirconium oxide in each of the abrasive grains having crystallites of monoclinic crystalline structures and crystallites of tetragonal crystalline structures as an abrasive, and in each of the zirconium oxide abrasive grains, a ratio of the amount of the tetragonal crystalline structures with respect to the amount of the monoclinic crystalline structures falls in a range of 0.7% to 3.0%, where the ratio is obtained by x-ray diffraction and is defined as a ratio of a peak intensity of the tetragonal crystalline structures with respect to a peak intensity of the monoclinic crystalline structures, and the peak intensity is defined as an integrated peak intensity.
地址 Tokyo JP