发明名称 TUNABLE TEMPERATURE CONTROLLED ELECTROSTATIC CHUCK ASSEMBLY
摘要 Embodiments include a pedestal to support a workpiece during plasma processing with tunable temperature control. In one embodiment, the pedestal includes an electrostatic chuck (ESC) having a top surface over which the workpiece is to be disposed. The pedestal includes one or more heating elements disposed under the top surface of the ESC. The pedestal includes a cooling base disposed under the ESC. The pedestal includes a plurality of compartments disposed between the cooling base and the top surface of the ESC, the plurality of compartments independently controllable to different pressures. One or more controllers independently control pressure in a first of the plurality of compartments to a first pressure and in a second of the plurality of compartments to a second pressure.
申请公布号 US2015060013(A1) 申请公布日期 2015.03.05
申请号 US201314019290 申请日期 2013.09.05
申请人 APPLIED MATERIALS, INC. 发明人 Buchberger, JR. Douglas A.
分类号 H01J37/32 主分类号 H01J37/32
代理机构 代理人
主权项 1. A pedestal to support a workpiece during plasma processing, the pedestal comprising: an electrostatic chuck (ESC) having a top surface over which the workpiece is to be disposed; one or more heating elements disposed under the top surface of the ESC; a cooling base disposed under the ESC; a plurality of compartments separated by gas seals and disposed between the top surface of the ESC and the cooling base, the plurality of compartments independently controllable to different pressures; wherein one or more controllers is to generate a plurality of temperature zones on the top surface of the electrostatic chuck based on maintaining a first pressure in a first of the plurality of compartments and a second pressure in a second of the plurality of compartments, the plurality of temperature zones comprising an inner circular zone and an outer annular zone azimuthally divided into a plurality of temperature sub-zones.
地址 SANTA CLARA CA US
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