发明名称 CHARGED PARTICLE BEAM LENS MODULE AND CHARGED PARTICLE BEAM DEVICE EQUIPPED WITH SAME
摘要 <p>To provide an adjustment means for an optical system in a charged particle beam device, the present invention provides the following constitution: a lens module characterized by having an electrostatic-type lens for charged particle beams and at least two stages of deflectors, the lens module being placeable in an optical system for a charged particle beam device using charged particles which have traversed a sample for imaging; or a charged particle beam device equipped with the same. The electrostatic-type lens for charged particle beams is provided in an optical system of imaging lenses for imaging an image of the sample with the charged particle beam, and the amount of defocusing for the image of the sample by the electrostatic-type lens is adjustable independently from the imaging lenses. The at least two stages of deflectors subject the charged particle beam to a deflection action in conjunction with a focal distance adjustment in the electrostatic-type lens for charged particle beams.</p>
申请公布号 WO2015029200(A1) 申请公布日期 2015.03.05
申请号 WO2013JP73242 申请日期 2013.08.30
申请人 HITACHI, LTD. 发明人 TAMAKI, HIROKAZU;HARADA, KEN
分类号 H01J37/12;H01J37/147;H01J37/21 主分类号 H01J37/12
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