COMPOSITIONS CONTAINING BLOCK COPOLYMERS AND PROCESSES FOR PHOTOLITHOGRAPHY

摘要

PROBLEM TO BE SOLVED: To provide new photoresist compositions that are useful for immersion lithography.SOLUTION: Preferred photoresist compositions of the invention comprise one or more block copolymers. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting a resist layer during immersion lithography processing.