| 摘要 |
<p>PURPOSE: An apparatus for making semiconductor is provided to remove a by-product attached a protective layer through a dry cleaning method by reducing a contact area through the improvement of a surface luminance. CONSTITUTION: A process gas is supplied to a reaction chamber(14). A vent(29) discharges a process gas of the reaction chamber. A gas discharge path(31) has a thermal spray coating on which is coated with a corrosion resistance oxide film by communicating the reaction chamber and the vent. A polished layer is arranged on a part of the thermal spray coating.</p> |
