| 摘要 |
The present invention related to an apparatus which can stably and efficiently perform repair modification a long time on fine parts of a mask and the likes with less damage on a sample. The apparatus (10) comprises at least: a gas field ionization ion source including a sharpened tip; a cooling means cooling the tip; an ion beam body tube (11) concentrating ion of gas generated in the gas field ionization ion source to form a focused ion beam; a movable sample stage (15) in which a sample is irradiated with the focused ion beam formed from the ion beam body tube (11); a sample chamber (13) in which the sample stage (15) is embedded; and a control part (20) repairing a sample mask (14) or a mold of a nano imprint lithography by the concentrated ion beam. The gas field ionization ion source has nitrogen as the ion, and includes a tip consisting of an iridium single crystal having a single peak which generates ion. |
