发明名称 HIGH-HARDNESS MATERIAL FOR IMPRINT
摘要 <p>There is provided an imprint material from which a film having a high hardness can be formed. An imprint material comprising a component (A), a component (B) and a component (C), the component (A) being a compound having, in the molecule thereof, five or more polymerizable groups, the component (B) being a compound having, in the molecule thereof, two polymerizable groups, and the component (C) being a photo-radical generator.</p>
申请公布号 KR101498530(B1) 申请公布日期 2015.03.04
申请号 KR20127007576 申请日期 2010.08.17
申请人 发明人
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
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