| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a positioning method of a substrate capable of recognizing first and second alignment marks accurately. <P>SOLUTION: The positioning method of a substrate includes a first alignment mark position information acquisition step (S13) for acquiring the position information of a first alignment mark by performing differentiation and projection addition in the X direction and Y direction and detecting the first alignment mark, a second alignment mark position information acquisition step (S16) for acquiring the position information of a second alignment mark by performing differentiation and projection addition in the X direction and Y direction for a region excepting the region occupied by the first alignment mark and detecting the second alignment mark, and a positioning step (S17) for moving the substrate and a mask relatively on the basis of the position information of the first alignment mark and the position information of the second alignment mark. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
