发明名称 Implementing enhanced optical mirror coupling and alignment utilizing two-photon resist
摘要 A method, system and computer program product for implementing an enhanced optical mirror coupling and alignment mechanism utilizing two-photon resist. An initial placement is provided for one or more vias on a printed circuit board. A via is filled with a resist. A series of tightly focused light beams suitably exposes the resist at varying depths in the via, the varying depths defining a sloped polymer in the via after removing resist that had not been at the focus of the light beam. The sloped polymer is coated with reflective material to reflect light into or out of the via.
申请公布号 US8968987(B2) 申请公布日期 2015.03.03
申请号 US201213347779 申请日期 2012.01.11
申请人 International Business Machines Corporation 发明人 Atta Emmanuel;Berger Darcy;Dangler John R.;Doyle Matthew S.;Hefner Jesse;Liang Thomas W.
分类号 G02B6/26;B05D5/06;G02B6/34 主分类号 G02B6/26
代理机构 代理人 Pennington Joan
主权项 1. A computer-implemented method for implementing enhanced optical mirror coupling and alignment in a printed circuit board comprising: identifying an initial via placement for one or more vias in the printed circuit board; filling a via with a resist; using the via for providing enhanced optical mirror coupling and alignment in the printed circuit board by defining a sloped polymer bridge across the via by exposing the resist at varying depths in the via with a series of tightly focused light beams and removing the resist outside of the sloped polymer bridge defined by the exposure; and coating one side of the sloped polymer bridge with a reflective material and providing an opposite side of the sloped polymer without plating, allowing the reflection of light to or from a waveguide through the reflective material formed in the via.
地址 Armonk NY US