| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing liquid composition for magnetic disk substrates, which composition, in one embodiment, can reduce the long-wavelength waviness on the surface of the roughly-polished substrate without largely deteriorating a polishing speed and the roll-off when the surface of the substrate is polished roughly.SOLUTION: The polishing liquid composition for magnetic disk substrates, in one embodiment, contains an aspherical silica particle, an alkylene oxide compound and water. The aspherical silica particle has such a shape that two or more particles are agglomerated or fused with one another. The alkylene oxide compound is an ethylene oxide(EO)-added and/or propylene oxide(PO)-added compound having a glycerin skeleton. The average addition molar number of EO to one hydroxyl value exceeds 1.00 and is smaller than 6.67 or the average addition molar number of PO to one hydroxyl value exceeds 0.33 and is smaller than 6.00. |
