METHOD FOR PRODUCING MASK BLANK, AND METHOD FOR PRODUCING TRANSFER MASK

摘要

PROBLEM TO BE SOLVED: To provide a method for producing a mask blank, in which the quality of the mask blank is stabilized by accurately controlling states of a thin film deposited by a sputtering method.SOLUTION: The thin film for forming a transfer pattern is deposited on a substrate by using a sheet-fed type sputtering apparatus and the sputtering method to produce the mask blank. After the thin film is deposited on the substrate in the sheet-fed type sputtering apparatus, the optical characteristic values of the thin film just after deposited and the temperature of the substrate are measured in the sheet-fed type sputtering apparatus. The optical characteristic values of the deposited thin film are evaluated on the basis of the measured results.