HEATED SHOWERHEAD ASSEMBLY

摘要

The present disclosure generally comprises a heated showerhead assembly that may be used to supply processing gases into a processing chamber. The processing chamber may be an etching chamber. When processing gas is evacuated from the processing chamber, the uniform processing of the substrate may be difficult. As the processing gas is pulled away from the substrate and towards the vacuum pump, the plasma, in the case of etching, may not be uniform across the substrate. Uneven plasma may lead to uneven etching. To prevent uneven etching, the showerhead assembly may be separated into two zones each having independently controllable gas introduction and temperature control. The first zone corresponds to the perimeter of the substrate while the second zone corresponds to the center of the substrate. By independently controlling the temperature and the gas flow through the showerhead zones, etching uniformity of the substrate may be increased.

主权项

1. A showerhead, comprising a showerhead body having: a first zone encircling a second zone, wherein the first zone has:
a first plenum disposed on a first side of the body; one or more second plenums disposed on the second side of the body; and a plurality of first bores arranged in a plurality of first annular patterns, the plurality of first bores extending from the first plenum to the one or more second plenums; andthe second zone has:
a third plenum disposed on the first side of the body; one or more fourth plenums disposed on the second side of the body; and a plurality of second bores arranged in a plurality of second annular patterns, the plurality of second bores extending from the third plenum to the one or more fourth plenums.