| 摘要 |
<p>The present invention relates to a gas supply member and a substrate treatment apparatus, the gas supply member comprising: a source gas supply pipe for supplying source gas; a cylindrical outer shell in communication with the gas supply member on one side and with a reaction apparatus on another side; a cylindrical intermittent source gas supply part, the outer circumferential surface of which is in contact with the inner circumferential surface of the outer shell, for cyclically supplying source gas to the reaction apparatus by rotating around a central shaft; and a driving part, coupled to the intermittent source gas supply part, for providing rotational power thereto. The present invention allows the intermittent source gas supply part to supply gas to the reaction apparatus via rotation without the opening and closing of a valve, thereby allowing an accurate mechanical control of the gas supply without using a costly valve system.</p> |
