| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a thin silicon film that easily produces a thin silicon film to be used in a semiconductor, a solar cell, a secondary battery, or the like, in a less number of steps and at a lower cost compared with a conventional process, and can thus enhance price competitiveness of a product.SOLUTION: A method for producing a thin silicon film includes a stage where a silicon oxide is applied onto a substrate and sintered to form a thin silicon oxide film, which is electrochemically reduced to form a porous silicon film followed by being resintered. The invention relates to the method for producing a thin silicon film, the thin silicon film produced thereby, and an electronic element having the thin silicon film. |
