发明名称 |
COMPOSITION FOR CHEMICAL VAPOR DEPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a charcoal silicon nitride film on base material by chemical vapor deposition of a precursor for forming the charcoal silicon nitride film.SOLUTION: A method for forming a charcoal silicon nitride film comprises using a precursor selected from a group including amino silane represented by formulas and a mixture thereof. |
申请公布号 |
JP2015039008(A) |
申请公布日期 |
2015.02.26 |
申请号 |
JP20140203493 |
申请日期 |
2014.10.01 |
申请人 |
AIR PRODUCTS AND CHEMICALS INC |
发明人 |
XIAO MANCHAO;HOCHBERG ARTHUR KENNETH |
分类号 |
H01L21/318;C23C16/18;C23C16/42 |
主分类号 |
H01L21/318 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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