| 摘要 |
<p>The invention relates to a method for regenerating a substrate, and the method allows the regeneration of a substrate by removing a mask blank with a thin film for pattern formation on a main surface of a substrate formed by glass, or removing the thin film of a mask for transfer printing prepared by the mask blank. In the method, the substrate is regenerated by contacting the mask blank or the thin film of the mask for transfer printing with an unexcited substance of a compound of fluorine (F) and any element of chlorine (Cl), bromine (Br), idodine (I), and xenon (Xe) and removing the mask blank or the thin film.</p> |
