| 摘要 |
To make it easy to adjust a location of an emission antenna in a plasma generation device that generates plasma by a discharge and enlarges the plasma by an electromagnetic wave. A plasma generation device 30 includes an electromagnetic wave generation device 31, an emission antenna 16, a high voltage generation device 14, and a discharge electrode 15. The emission antenna 16 forms a discharge gap together with the discharge electrode 15 which a high voltage outputted from the high voltage generation device 14 is applied to. The plasma generation device 30 enlarges discharge plasma using the electromagnetic wave emitted from the emission antenna 16 caused by the electromagnetic wave outputted from the electromagnetic wave generation device 31, where the discharge plasma is generated at the discharge gap by an output of a high voltage from the high voltage generation device 14. |
