SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a substrate processing method capable of achieving excellent substrate processing while suppressing the consumption amount of process liquid.SOLUTION: A substrate processing apparatus 1 includes: a reservoir part 2 having an opening 2a on the top surface and storing process liquid therein; a holding part 3 for holding a substrate W having a processing object surface Wa so as to close the opening 2a by directing the reservoir part 2 to the processing object surface Wa; and a supply part 5 for supplying the process liquid to a position in the reservoir part 2, which is in contact with the processing object surface Wa of the substrate W held by the holding part 3.