SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a technique, in a manufacturing process of a semiconductor device formed by using a thin film transistor, where the number of photo masks can be reduced, a manufacturing cost can be reduced, and productivity and reliability can be improved.SOLUTION: A method for manufacturing a semiconductor device comprises the steps of: forming a light-transmitting film for forming a channel protection layer on an oxide semiconductor layer; forming a positive photoresist on the film for forming the channel protection layer; and selectively forming a channel protection layer on a channel formation region in the oxide semiconductor layer by using a back surface light exposure method.