发明名称 ADAPTIVE PHOTOMASKS AND METHODS FOR USING THE SAME
摘要 The embodiments described herein relate to methods, devices, and systems for masking a substrate using a photomasking process. An adaptive photomask configured to generate a photomasking pattern in accordance with dimensions of a surface feature on substrate is described. The adaptive photomask can be used to create customized photomask patterns for individual substrates. Methods and devices described herein can be used in manufacturing processes where similar parts having slight differences due to built-in tolerances are manufactured. Methods and a devices described herein can also be used in manufacture processes involving masking of three-dimensional portions of a part. A photomasking system that includes a translational mechanism for scanning a substrate surface is described.
申请公布号 US2015049324(A1) 申请公布日期 2015.02.19
申请号 US201313970534 申请日期 2013.08.19
申请人 Apple Inc. 发明人 Tan Napthaneal Yuen
分类号 G03F1/36 主分类号 G03F1/36
代理机构 代理人
主权项 1. A method for using a configurable aperture to dynamically activate a corresponding portion of a photoresist layer disposed on a surface of a substrate and associated with at least one surface feature, the method comprising: (a) receiving a set of dimensional data associated with the at least one surface feature, the set of dimensional data including data corresponding to a boundary of the at least one surface feature; and (b) adjusting a size and shape of a transmissive portion of the configurable aperture in accordance with the received set of dimensional data, the transmissive portion allowing energy used to activate the corresponding portion of the photoresist layer to pass.
地址 Cupertino CA US