Rapid Thermal Processing Chamber with Micro-Positioning System

摘要

Methods and apparatus for rapid thermal processing of a planar substrate including axially aligning the substrate with a substrate support or with an empirically determined position are described. The methods and apparatus include a sensor system that determines the relative orientations of the substrate and the substrate support.

主权项

1. A method of processing a substrate, comprising:
transferring a planar substrate having an edge into a processing chamber onto an intermediate substrate support; transmitting a reflective light beam from one sensor through a space between the substrate and a second substrate support; determining a theta adjustment value for axially aligning the substrate relative to the second substrate support; adjusting a position of the substrate relative to the second substrate support using the theta adjustment value so that the substrate and the second substrate support are substantially in axial alignment; and transferring the substrate to the second substrate support.