发明名称 めっき装置、めっき方法およびチップ型電子部品の製造方法
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a plating device which can efficiently perform plating treatment in a short plating time, and can improve the quality of the object to be plated, a plating method, and a method for producing a chip type electronic component. <P>SOLUTION: The plating device includes: a first cathode electrode 23b composing at least a part of the inner circumferential wall face 23a of a recessed vessel 20a storing a plating liquid; a second cathode electrode 22b insulated from the first cathode electrode 23b and composing at least a part of the bottom face 22a of the recessed vessel 20a; an anode electrode 40 dipped into the plating liquid 30 stored into the recessed vessel 20a; and a rotating tool 21a rotating the recessed vessel 20a around a central axis 20T almost vertical to the bottom face 22a. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP5672717(B2) 申请公布日期 2015.02.18
申请号 JP20100040788 申请日期 2010.02.25
申请人 发明人
分类号 C25D17/18 主分类号 C25D17/18
代理机构 代理人
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