发明名称 |
Magnetic sensor and pattern for magnetic sensor |
摘要 |
A magnetic sensor includes a substrate, and a pattern forming region on the substrate, the pattern forming region having a substantially quadrangle shape. The pattern forming region includes a magnetic detection element pattern that includes a plurality of linear parts arranged parallel to each other at a predetermined inclination angle to two sides of the quadrangle shape, and a plurality of turning parts configured to alternately connect both end portions in a longitudinal direction of adjacent linear parts of the plurality of linear parts. The magnetic detection element pattern further includes a first pattern, and a second pattern with a resistance change ratio less than the first pattern. An area of the magnetic detection element pattern is less than an area of the pattern forming region in a plane view. |
申请公布号 |
US8957680(B2) |
申请公布日期 |
2015.02.17 |
申请号 |
US201213466226 |
申请日期 |
2012.05.08 |
申请人 |
Kabushiki Kaisha Tokai Rika Denki Seisakusho |
发明人 |
Mori Daisuke |
分类号 |
G01R33/02;G01R33/06;G01B7/30;G01R33/09 |
主分类号 |
G01R33/02 |
代理机构 |
Roberts Mlotkowski Safran & Cole P.C. |
代理人 |
Roberts Mlotkowski Safran & Cole P.C. |
主权项 |
1. A magnetic sensor, comprising:
a substrate; and a pattern forming region on the substrate, the pattern forming region having a substantially quadrangle shape, wherein the pattern forming region comprises a magnetic detection element pattern that comprises a plurality of linear parts arranged parallel to each other at a predetermined inclination angle to two sides of the quadrangle shape, and a plurality of turning parts configured to alternately connect both end portions in a longitudinal direction of adjacent linear parts of the plurality of linear parts, wherein the magnetic detection element pattern further comprises a first pattern, and a second pattern with a resistance change ratio less than the first pattern, wherein an area of the magnetic detection element pattern is less than an area of the pattern forming region in a plane view, and wherein the pattern forming region further comprises a dummy pattern formed in a region without the magnetic detection element pattern such that the second pattern has a resistance ratio of the turning parts to the linear parts, the resistance ratio being not more than 8%. |
地址 |
Aichi JP |