摘要 |
<p>PROBLEM TO BE SOLVED: To manufacture an MEMS device with high yield.SOLUTION: A MEMS device comprises a substrate, a cavity part 80 formed on the substrate, a support part 40 formed on the top face of the cavity part 80, and a heat detection element 60 formed on the support part 40. A first barrier layer 31 is formed on at least a side face of the cavity part 80, and a second barrier layer 32 is formed on the top face of the cavity part 80, the first barrier layer 31 having a protrusion 33 protruding from the top face of the cavity part 80. The second barrier layer 32 is formed on at least one face of the protrusion 33. Adhesion of the first barrier layer 31 to the second barrier layer 32 is improved by the protrusion 33, so that the possibility of an etching material leaking when the cavity part 80 is formed can be suppressed, and a manufacturing yield of the MEMS device is improved.</p> |