| 摘要 |
<p>The present invention is a method for producing a conductive thin film laminate that comprises a substrate and a conductive thin film formed on the substrate. The conductive thin film is formed by applying a conductive thin film precursor over the substrate or over a conductive thin film formed on the substrate, and then heating the applied precursor with infrared light. The substrate has the minimum value of infrared light transmittance within the wavelength range of 2,000-3,300 nm, and the product (alpha) of the wavelength at the minimum value of infrared light transmittance and the peak wavelength of the infrared light is from 2 mum2 to 16 mum2 (inclusive).</p> |
