发明名称 SEMICONDUCTOR LASER MANUFACTURING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a semiconductor laser manufacturing method which can increase a carrier concentration of a clad layer.SOLUTION: A semiconductor laser manufacturing method comprises: a process of epitaxially growing a clad layer 14, an active layer 16 and a clad layer 18 sequentially on a substrate 10 which is composed of InP or GaAs and has a surface index of (100); a process of forming a plurality of growth start surfaces each having a surface index larger than (100) on a top face of the clad layer 18; and a process of epitaxially growing a zinc-containing clad layer 24 on the growth start surface of the clad layer 18.</p>
申请公布号 JP2015029025(A) 申请公布日期 2015.02.12
申请号 JP20130158314 申请日期 2013.07.30
申请人 SUMITOMO ELECTRIC DEVICE INNOVATIONS INC 发明人 ISHIURA MASAMI
分类号 H01S5/227;H01S5/343 主分类号 H01S5/227
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