| 发明名称 |
METHOD OF FORMING PATTERN |
| 摘要 |
A method of forming a pattern is disclosed. First, N kinds of different photomask patterns are provided. Thereafter, the N kinds of different photomask patterns are transferred to a hard mask layer by using at least N−1 kinds of light sources with different wavelengths, so as to form a hard mask pattern, wherein one of the at least N−1 kinds of light sources with different wavelengths is a light source with a wavelength of 193 nm, and N is an integer of three or more. |
| 申请公布号 |
US2015044875(A1) |
申请公布日期 |
2015.02.12 |
| 申请号 |
US201313963631 |
申请日期 |
2013.08.09 |
| 申请人 |
United Microelectronics Corp. |
发明人 |
Tung Yu-Cheng |
| 分类号 |
H01L21/308;H01L21/033;G03F1/68 |
主分类号 |
H01L21/308 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of forming a pattern, comprising:
providing N kinds of different photomask patterns; and transferring the N kinds of different photomask patterns to a hard mask layer by using at least N−1 kinds of light sources with different wavelengths, so as to form a hard mask pattern, wherein one of the at least N−1 kinds of light sources with different wavelengths is a light source with a wavelength of 193 nm, and N is an integer of three or more. |
| 地址 |
Hsinchu TW |
