发明名称 METHOD OF PRODUCING SUBSTRATE, METHOD OF PRODUCING MULTI-LAYER REFLECTION COATING-PROVIDED SUBSTRATE, METHOD OF PRODUCING MASK BLANK, METHOD OF PRODUCING MASK FOR TRANSFER AND SUBSTRATE PROCESSING APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To provide a method of producing a substrate which enables stable production of a substrate having a main surface high in smoothness and low in occurrence of defects.SOLUTION: A method of producing a substrate includes a substrate preparation step of preparing a substrate having a main surface composed of a material containing an oxide and a substrate processing step of bringing a processing reference surface of a catalytic substance into contact with the main surface or causing the processing reference surface to approach the main surface and processing the main surface by catalytic reference etching. The catalytic substance is one selected from alloys containing at least one of titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, iron, ruthenium and osmium and alloy compounds consisting of one of the alloys containing at least one ingredient of oxygen, nitrogen and carbon.</p>
申请公布号 JP2015028626(A) 申请公布日期 2015.02.12
申请号 JP20140133847 申请日期 2014.06.30
申请人 HOYA CORP 发明人 KANEKO YOSHIHARU;ORIHARA TOSHIHIKO;IKEBE YOHEI
分类号 G03F1/82;C03C17/36;C03C19/00;G03F1/24;G03F1/60;G11B5/84;H01L21/027 主分类号 G03F1/82
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