| 摘要 |
<p>An electron beam evaporation apparatus can prevent secondary electron or reflection electron generated by electron beam evaporation from being attached to a substrate and prevent deposition from being disturbed by a magnet itself blocking electron as a blocking material. A container (crucible (2)) of a deposition material is positioned on a lower side of substrate (1) to be deposited. A pair of magnets (4A, 4B) is installed on both sides of the container to be apart from the container at a predetermined distance in an upper area of the center of a substrate (1) in the center of the container. The magnets are arranged so that one ends of the magnet on the center side of the substrate slope downward from the other ends of the magnet. The electron beam evaporation apparatus can prevent the characteristics of organic device from being deteriorated if the secondary electron or reflection electron generated when an electron beam is deposited is irradiated on the organic film on the substrate while the electron beam is deposited, thereby obtaining the same characteristics as the organic device manufactured by resistance heat metal deposition. Also, the electron beam evaporation apparatus enables deposition on the entire substrate by preventing the magnets from becoming a blocking material of a deposition.</p> |
