Method for depositing high aspect ratio molecular structures

摘要

A method for depositing high aspect ratio molecular structures (HARMS), which method comprises applying a force upon an aerosol comprising one or more HARM-structures, which force moves one or more HARM-structures based on one or more physical features and/or properties towards one or more predetermined locations for depositing one or more HARM-structures in a pattern by means of an applied force.

主权项

1. A method for depositing high aspect ratio molecular structures (HARM-structures), wherein the method comprises:
applying a DC-generated electrostatic force upon a gaseous dispersion containing individual and bundled HARM-structures, wherein the bundled HARM-structures are naturally charged and the individual structures are uncharged, moving the naturally charged bundled HARM-structures based on one or more physical features and/or properties towards one or more predetermined locations by means of the applied DC-generated electrostatic force, wherein said moving separates the individual HARM-structures from the bundled HARM-structures, charging the separated individual HARM-structures by passing said separated individual HARM-structures through an electron cloud, applying a second electrostatic force upon the charged individual HARM-structures, and depositing one or more of the charged individual HARM-structures by means of the applied second electrostatic force.