发明名称 |
Semiconductor storage device |
摘要 |
A semiconductor storage device has a plurality of memory cells each having a control gate that are formed on a well. The semiconductor storage device has a control circuit that applies a voltage to the well and the control gates.;In an erase operation of the memory cell, the control circuit applies a first pulse wave of a first erasure voltage that rises stepwise to the well and then applies a second pulse wave of a second erasure voltage to the well. |
申请公布号 |
US8953371(B2) |
申请公布日期 |
2015.02.10 |
申请号 |
US201213425121 |
申请日期 |
2012.03.20 |
申请人 |
Kabushiki Kaisha Toshiba |
发明人 |
Shiino Yasuhiro;Irieda Shigefumi;Nakai Kenri;Takahashi Eietsu;Ueno Koki |
分类号 |
G11C11/34;G11C11/56;G11C16/06;G11C16/04;G11C16/34 |
主分类号 |
G11C11/34 |
代理机构 |
Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. |
代理人 |
Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. |
主权项 |
1. A semiconductor storage device, comprising:
a plurality of memory cells each having a control gate that are formed on a well; and a control circuit that applies a voltage to the well and the control gates, wherein in an erase operation of the memory cell, the control circuit applies a first pulse wave of a first erase voltage that rises stepwise to the well and then applies a second pulse wave of a second erase voltage to the well, the second erase voltage is a square wave, and a step difference of the first erase voltage that rises stepwise is smaller than a difference between the second erase voltage of the second pulse wave and a final value of the first erase voltage that rises stepwise. |
地址 |
Tokyo JP |