发明名称 |
Polysiloxane-modified polyhydroxy polyurethane resin, method for producing same, heat-sensitive recording material using the resin, imitation leather, thermoplastic polyolefin resin skin material, material for weather strip, and weather strip |
摘要 |
Disclosed are a polysiloxane-modified polyhydroxy polyurethane resin characterized by being derived from a reaction between a 5-membered cyclic carbonate polysiloxane compound represented by the below-described formula (1) and an amine compound, and its production process; and a resin composition, thermal recording medium, imitation leather, thermoplastic polyolefin resin skin material, weather strip material, and weather strip, all of which make use of the resin.;
wherein A means
; |
申请公布号 |
US8951933(B2) |
申请公布日期 |
2015.02.10 |
申请号 |
US201013510576 |
申请日期 |
2010.11.25 |
申请人 |
Dainichiseika Color & Chemicals Mfg. Co., Ltd.;Ukima Chemicals & Color Mfg. Co., Ltd. |
发明人 |
Hanada Kazuyuki;Kimura Kazuya;Takahashi Kenichi;Kawakami Osamu;Uruno Manabu |
分类号 |
B41M5/40;B60R13/02;C08G18/61;C08L83/04;C09D175/04;D06N3/14;B32B27/12;B32B27/28;B32B27/40;B41M5/44 |
主分类号 |
B41M5/40 |
代理机构 |
Hamre, Schumann, Mueller & Larson, P.C. |
代理人 |
Hamre, Schumann, Mueller & Larson, P.C. |
主权项 |
1. A thermal recording medium comprising:
a base material sheet; a thermal recording layer arranged on at least one side of the base material sheet; and a heat-resistant protective layer arranged on another side of the base material sheet, said another side being a back side to be brought into contact with a thermal head, wherein the heat-resistant protective layer is formed with a resin composition that comprises at least a polysiloxane-modified polyhydroxy polyurethane resin wherein the polysiloxane-modified polyhydroxy polyurethane resin is derived from a reaction between a 5-membered cyclic carbonate polysiloxane compound represented by the following formula (1) and an amine compoundL wherein A isin which R1 is an alkylene group that has from 1 to 12 carbon atoms and may have therin a linkage by an element selected from the group consisting of O, S, and N or a linkage by —(C2H4O)b or both the linkages,
R2 is a direct bond or an alkylene group having from 2 to 20 carbon atoms, wherein R2 may be linked to an alicyclic group or aromatic group,
b stands for a number from 1 to 300, anda stands for a number from 1 to 300. |
地址 |
Tokyo JP |