| 摘要 |
<p>PURPOSE: A jig for a substrate-treating apparatus and a maintenance method using the same are provided to maintain the interval of a gas distributing plate and a substrate uniform by easily placing the center of gas distributing plate to a diffuser cover. CONSTITUTION: A first jig(110) includes a plurality of vertical parts. A second jig(120) is ascended to the height of a plurality of vertical part. The chamber cover(104) including a diffuser cover therein is arranged in a first jig. The second jig including a first gas distribution plate(132) is received into the first jig. A first gas distribution plate and the second jig are ascended to the height of a plurality of vertical part. The ascended first gas distribution plate is combined with the diffuser cover.</p> |
