发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing apparatus performing predetermined processing for a substrate while levitation transferring the substrate, in which the processing can be performed with good uniformity.SOLUTION: A substrate processing apparatus includes a floating plate 10 for floating a substrate 11, a substrate transfer section for transferring the substrate 11 while floating the substrate 11, and a substrate processing section 20 arranged above the floating plate 10 and performing a predetermined processing for the substrate 11. When a predetermined processing is performed for the substrate 11 by the substrate processing section 20, the substrate 11 is transferred above the floating plate 10, while covering the region of the floating plate 10, not covered with the substrate 11, with shield plates 12a, 12b.
申请公布号 JP2015026733(A) 申请公布日期 2015.02.05
申请号 JP20130155793 申请日期 2013.07.26
申请人 TORAY ENG CO LTD 发明人 HAMAKAWA KENJI;OKUDA TETSUYA
分类号 H01L21/677;B65G49/06 主分类号 H01L21/677
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