发明名称 (METH)ACRYLATE COMPOUND AND POLYMERIC COMPOUND USING THE (METH)ACRYLATE COMPOUND
摘要 PROBLEM TO BE SOLVED: To provide a (meth)acrylate compound suitable for a photoresist that has excellent light-transmitting property at a wavelength of 300 nm or less, particularly 250 nm or less, and therefore, has excellent photosensitivity and resolution and that can be used as a permanent film, and to provide a polymeric compound using the (meth)acrylate.SOLUTION: The (meth)acrylate compound is expressed by formula (1) below, and the polymeric compound is prepared by using the (meth)acrylate. In formula (1), Rrepresents a hydrogen atom or a methyl group; Rrepresents a single bond; Rrepresents a fluorophenylene group in which 1 to 4 fluorine atoms are bonded, or a divalent hydrocarbon group having a fluorophenylene group in which 1 to 4 fluorine atoms are bonded, and optionally having an oxygen atom; and Rrepresents a monovalent organic group that desorbs by a strong acid.
申请公布号 JP2015025109(A) 申请公布日期 2015.02.05
申请号 JP20130198374 申请日期 2013.09.25
申请人 SHOWA DENKO KK 发明人 ONO YUKI;FURUE KENTARO
分类号 C08F20/28;C07D309/12;G03F7/039 主分类号 C08F20/28
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