| 发明名称 |
SUBSTRATE SUPPORT WITH SURFACE FEATURE FOR REDUCED REFLECTION AND MANUFACTURING TECHNIQUES FOR PRODUCING SAME |
| 摘要 |
Methods and apparatus are provided for reducing the thermal signal noise in process chambers using a non-contact temperature sensing device to measure the temperature of a component in the process chamber. In some embodiments, a susceptor for supporting a substrate in a process chamber includes a first surface comprising a substrate support surface; and a second surface opposite the first surface, wherein a portion of the second surface comprises a feature to absorb incident radiant energy. |
| 申请公布号 |
US2015037017(A1) |
申请公布日期 |
2015.02.05 |
| 申请号 |
US201414324557 |
申请日期 |
2014.07.07 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
LAU SHU-KWAN;RANISH JOSEPH M.;BRILLHART PAUL;SAMIR MEHMET TUGRUL |
| 分类号 |
H05B3/00 |
主分类号 |
H05B3/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A susceptor for supporting a substrate in a process chamber, comprising:
a first surface comprising a substrate support surface; and a second surface opposite the first surface, wherein a portion of the second surface comprises a feature to absorb incident radiant energy at a wavelength of about 1.0 micrometer to about 4.0 micrometers. |
| 地址 |
Santa Clara CA US |
