PATTERN FORMATION METHOD AND SURFACE TREATMENT AGENT USED THEREIN, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

摘要

Provided is a pattern formation method with which a pattern having excellent flatness of a pattern top part and pattern durability with double development can be formed, the method comprising, in succession, the following: (1) a step for forming an actinic ray-sensitive or radiation-sensitive film from an actinic ray-sensitive or radiation-sensitive resin composition containing a resin that produces polar groups when decomposed by exposure to acid; (2) a step for exposing the actinic ray-sensitive or radiation-sensitive film; (4A) a step for exposing the actinic ray-sensitive or radiation-sensitive film to a surface treatment agent containing a compound that interacts with the polar groups contained in the resin after exposure; and (5A) a step for developing the actinic ray-sensitive or radiation-sensitive film using a developing solution containing an organic solvent. Also provided is a surface treatment agent used in the pattern formation method, a method for producing an electronic device, and an electronic device.