| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid processing apparatus in which the position of a substrate can be detected, while avoiding contamination of a light projecting section and a light receiving section.SOLUTION: A liquid processing apparatus 1 performing liquid processing by supplying process liquid from a liquid supply section to a substrate W held horizontally in a substrate holding section 2 includes a plurality of lifting members 54 arranged in the circumferential direction of the substrate W. These lifting members 54 are provided, respectively, with a light projecting section 511 for detecting a horizontal optical path 50 used for detecting the position of the substrate W, and a light receiving section 512 for receiving light from the light projecting section 511. Lifting mechanisms 254, 55 lift and lower a lifting member 514 so that the height of the light projecting section 511 and light receiving section 512 changes between the substrate position detecting position, and a retraction position below the process liquid supply surface of the substrate W. |
