发明名称 PROBE DEVICE
摘要 PROBLEM TO BE SOLVED: To realize reducing of contact resistance and uniformization between a rear side electrode and a placement surface conductor of a chuck top, relating to a probe device which performs electrical characteristic inspection of a power device containing an electrode on both surfaces of the substrate at a wafer level.SOLUTION: In a probe device, a sucking mechanism for holding a semiconductor wafer W on a chuck top 12 has innumerable vertical fine holes in a pattern that satisfies a condition of &phgr;<p&le;2 &phgr; ( aperture &phgr;, pitch p) on a placement surface conductor of the chuck top. As one example, aperture &phgr;=0.25 mm, and pitch p=0.5 mm.
申请公布号 JP2015026765(A) 申请公布日期 2015.02.05
申请号 JP20130156505 申请日期 2013.07.29
申请人 TOKYO ELECTRON LTD 发明人 SHINOHARA EIICHI;NAGASAKA MUNETOSHI;INOMATA ISAMU;YANO KAZUYA
分类号 H01L21/66;G01R1/073;H01L21/683 主分类号 H01L21/66
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