发明名称 |
DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF |
摘要 |
Disclosed is a display device including a transistor showing extremely low off current. In order to reduce the off current, a semiconductor material whose band gap is greater than that of a silicon semiconductor is used for forming a transistor, and the concentration of an impurity which serves as a carrier donor of the semiconductor material is reduced. Specifically, an oxide semiconductor whose band gap is greater than or equal to 2 eV, preferably greater than or equal to 2.5 eV, more preferably greater than or equal to 3 eV is used for a semiconductor layer of a transistor, and the concentration of an impurity which serves as a carrier donor included is reduced. Consequently, the off current of the transistor per micrometer in channel width can be reduced to lower than 10 zA/μm at room temperature and lower than 100 zA/μm at 85° C. |
申请公布号 |
US2015034951(A1) |
申请公布日期 |
2015.02.05 |
申请号 |
US201414515570 |
申请日期 |
2014.10.16 |
申请人 |
Semiconductor Energy Laboratory Co., Ltd. |
发明人 |
Yamazaki Shunpei |
分类号 |
H01L27/15;G02F1/1333;G02F1/1362;H01L29/12;G02F1/1368 |
主分类号 |
H01L27/15 |
代理机构 |
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代理人 |
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主权项 |
1. A liquid crystal display device comprising a pixel, the pixel comprising:
a transistor; and a liquid crystal element electrically connected to the transistor, wherein the transistor comprises:
a gate electrode;a first insulating layer over the gate electrode; aan oxide semiconductor layer over the first insulating layer;a source terminal and a drain terminal over the oxide semiconductor layer; anda second insulating layer over the source terminal and the drain terminal, wherein off current of the transistor is lower than 10 zA/μm at room temperature. |
地址 |
Atsugi-shi JP |