发明名称 |
PHOTOSENSITIVE-RESIN COMPOSITION |
摘要 |
This invention pertains to a photosensitive-resin composition containing the following: (A) an acid-modified-vinyl-group-containing epoxy resin; (B) an acyl-phosphine-oxide photopolymerization initiator; (C) one or more additives selected from among (C1) alkylamino-benzene derivatives, (C2) pyrazoline sensitizers or anthracene sensitizers, (C3) one or more photopolymerization initiators selected from among imidazole photopolymerization initiators, acridine photopolymerization initiators, and titanocene photopolymerization initiators, (C4) one or more antioxidants selected from among hindered-phenol antioxidants, quinone antioxidants, amine antioxidants, sulfur antioxidants, and phosphorus antioxidants, and (C5) thiol-group-containing compounds; and (D) a photopolymerizable compound. |
申请公布号 |
WO2015016362(A1) |
申请公布日期 |
2015.02.05 |
申请号 |
WO2014JP70400 |
申请日期 |
2014.08.01 |
申请人 |
HITACHI CHEMICAL COMPANY, LTD. |
发明人 |
FUSE, YOSHIAKI;YOSHINO, TOSHIZUMI;KOJIMA, MASAYUKI;OOSAKI, SHINYA;SATOU, KUNIAKI |
分类号 |
G03F7/004;C08F290/14;C08G59/17;G03F7/027;G03F7/029;H01L21/027;H05K3/28 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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